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Micro Structural Development of in Situ Heated and Deformed Pure and Silica Gel-Doped Polycrystalline Halite Using High Energy Synchrotron Radiation



Author(s)

Caterina E. Tommaseo

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DOI:10.17265/2159-581X/2015.01.002

This paper presents an experimental investigation of the microstructural development upon in situ compression and heating of pure and SiO₂ gel-doped (5 wt%) polycrystalline halite, with grain sizes ranging from 45 µm to >70 µm (cold pressed at 200 MPa and heated at 150 °C for one week), using high energy synchrotron x-ray radiation. Texture development of the samples was studied at room temperature, 100, 200 and 300 °C. At each temperature, the samples were axially compressed keeping the load constant at every ~500 N step up to the maximum 2,400 N (~ 48 MPa). At the different loads and temperatures, 2D images and load/elongation curves were recorded in situ to get information about the texture development and the rheological behaviour of the polycrystalline halite samples. At high stresses, the doped halite samples show an increase in the elastic moduli and in the microstrain. The results were confirmed by the single grain orientation analyses using the FABLE program, where a sharpening of the texture was observed.

Polycrystalline halite, in situ experiments, microstructural development, silica gel.