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This work is licensed under a Creative Commons Attribution-NonCommercial 4.0 International License
Article
Author(s)
Enrique Camps1*, Johans S. Restrepo2, Stephen Muhl2 and José G. Quiñones-Galván3
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DOI:10.17265/2161-6221/2015.7-8.012
Affiliation(s)
1. Departamento de Física, Instituto Nacional de Investigaciones Nucleares, Apartado Postal 18-1027, México D.F., C.P. 11801, México
2. Instituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Apartado Postal 70-360, México, D. F., C. P. 04510, México
3. Departamento de Física, CUCEI, Universidad de Guadalajara, CP 44430, Guadalajara, Jalisco, México
ABSTRACT
Ti-Al-N coatings have been widely studied especially those with high aluminum content for different industrial applications because they have high wear resistance and good thermal stability. For the present work TiAlN thin films were prepared by the simultaneous laser ablation of Ti and Al targets in a reactive atmosphere containing nitrogen. The structural characterization of the deposits was carried out using X-ray diffraction and it was found that the films were highly oriented in the (111) direction of TiN. The maximum coating hardness was 43 GPa for an aluminum concentration close to 11 at.%, whilst the coatings commonly used in industry with an aluminum content of about 25 at.% or greater, have hardness values between 25 and 30 GPa. The thermal stability of the films was studied by micro-Raman spectroscopy in the temperature range from 500 to 900 ºC. This technique was used to detect the formation of the TiO2 phase. The results indicated that the inclusion of relatively low aluminum contents up to 15 at.% led to an improved thermal stability up to 900 ºC.
KEYWORDS
TiAlN thin films, laser ablation, hardness, thermal stability, tribology.
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