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Affiliation(s)

Instituto de Física, Universidad Nacional Autónoma de México, A.P. 20 364, 01000, Ciudad de México, MEXICO

ABSTRACT

Vanadium Oxide thin films were deposited by RF Magnetron sputtering using a V2O5 target on glass and on FTO/Glass substrates without O2 and with a O2 atmosphere in the deposition chamber respectively. The effects of O2 on compositional, structural, electrical and optical properties has been studied using, EDS (Energy dispersive spectroscopy), XRD (X-rays diffraction), Scanning and Transmission Electron Microscopy (SEM) and (TEM) respectively, UV and Visible Spectroscopy and the Four Points method to study electric surface properties. Abrupt variations in electrical resistivity as the films were heated around 255 ºC suggest a change of phase from semiconductor to a metallic material. The β-V2O5 films present electrochromic behavior under an external voltage, but Cyclic Voltammetry experiments reveal poor durabilitty of electrochromic properties.

KEYWORDS

Vanadium oxide, oxygen content, thin films.

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