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Article
Affiliation(s)

Laboratory of Materials Physics, Microelectronics, Automatic and Thermic, Faculty of Sciences Ain Chock Km8, University Hassan II, Casablanca 5366, Morocco

ABSTRACT

A phenomenological low-filed mobility model is developed to describe the dependence of the carrier mobility on the gate to source bias applied for AlGaN/GaN high electron mobility transistor. The results show excellent agreement with experimental data, when compared thereby proving the validity of the model. In the proposed work the temporal evolution of the mobility degradation shows a sharp decline in emission rates below 456 s-1. We also note a sharp decline for large defects densities.

KEYWORDS

AlGaN/GaN, HEMT, low-filed mobility model.

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